無等離子體損傷GaN HEMT極化隔離的設計與優化Design and optimization of polarization isolation toward plasma-damage-free GaN HEMT戴貽鈞中國科學院寧波材料技術與工程研究所DAI YiyunNingbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences
電熱應力下碳化硅功率MOSFET損傷的多尺度探測表征方法Multi-scale Detection and Characterization of SiC Power MOSFET Damage under Electro-thermal Stress劉斯揚東南大學教授LIU SiyangProfessor of Southeast University
