無等離子體損傷GaN HEMT極化隔離的設計與優化Design and optimization of polarization isolation toward plasma-damage-free GaN HEMT戴貽鈞中國科學院寧波材料技術與工程研究所DAI YiyunNingbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences
SiC等離子體波脈沖功率器件與應用研究Research on 4H-SiC Plasma Wave Pulsed Power Devices and its Applications孫樂嘉西安電子科技大學副教授SUN LejiaAssociate Professor of Xidian University
等離子刻蝕技術在第三代化合物半導體領域的應用Application of Plasma Etching Technology in the Third-generation Compound Semiconductor Field謝秋實北京北方華創微電子裝備有限公司 第一刻蝕事業部副總經理XIE QiushiDeputy General Manager of NAURA Technology Group Co., Ltd.
